Assembling ferromagnetic single-electron transistors by atomic force microscopy
2007 (English)In: Nanotechnology, ISSN 0957-4484, E-ISSN 1361-6528, Vol. 18, no 5, p. 055302-Article in journal (Refereed) Published
Abstract [en]
We demonstrate the assembly of nanoscale ferromagnetic single-electron transistors using atomic force microscopy for imaging as well as for nanoscale manipulation. A single 30 nm Au disc, forming the central island of the transistor, is manipulated with angstrom precision into the gap between a plasma-oxidized Ni source and drain electrodes. The tunnel resistances can be tuned in real time during the device fabrication by repositioning the Au disc. Transport measurements reveal long-term stable single-electron transistor characteristics at 4.2 K. The well-controlled devices with very small central islands facilitate future in-depth studies of the interplay between Coulomb blockade, spin-dependent tunnelling and spin accumulation in ferromagnetic single-electron transistors at elevated temperatures.
Place, publisher, year, edition, pages
Bristol: Institute of Physics (IOP), 2007. Vol. 18, no 5, p. 055302-
Keywords [en]
Atomic force microscopy, Coulomb blockade, Electrodes, Electron tunneling, Ferromagnetic materials, Imaging techniques, Plasmas, Drain electrodes, Plasma-oxidized, Single-electron transistors, Spin-dependent tunnelling, Transistors, Atomic force microscopy, Electrode, Semiconductor, Single electron transistor
National Category
Physical Sciences
Identifiers
URN: urn:nbn:se:hh:diva-3467DOI: 10.1088/0957-4484/18/5/055302ISI: 000243854900005Scopus ID: 2-s2.0-33947491239OAI: oai:DiVA.org:hh-3467DiVA, id: diva2:293072
2010-02-102009-12-012018-04-03Bibliographically approved