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Automatic Image Quality Assessment with Application in Biometrics
Halmstad University, School of Information Science, Computer and Electrical Engineering (IDE), Halmstad Embedded and Intelligent Systems Research (EIS).
Halmstad University, School of Information Science, Computer and Electrical Engineering (IDE), Halmstad Embedded and Intelligent Systems Research (EIS).
Halmstad University, School of Information Science, Computer and Electrical Engineering (IDE), Halmstad Embedded and Intelligent Systems Research (EIS).
2006 (English)In: Proceedings of the IEEE Computer Society Conference on Computer Vision and Pattern Recognition / [ed] Cordelia Schmid, Stefano Soatto, Carlo Tomasi., Los Alamitos, Calif.: IEEE Computer Society, 2006, 7- p.Conference paper, (Refereed)
Abstract [en]

A method using local features to assess the quality of an image, with demonstration in biometrics, is proposed. Recently, image quality awareness has been found to increase recognition rates and to support decisions in multimodal authentication systems significantly. Nevertheless, automatic quality assessment is still an open issue, especially with regard to general tasks. Indicators of perceptual quality like noise, lack of structure, blur, etc. can be retrieved from the orientation tensor of an image, but there are few studies reporting on this. Here we study the orientation tensor with a set of symmetry descriptors, which can be varied according to the application. Allowed classes of local shapes are generically provided by the user but no training or explicit reference information is required. Experimental results are given for fingerprint. Furthermore, we indicate the applicability of the proposed method to face images.

Place, publisher, year, edition, pages
Los Alamitos, Calif.: IEEE Computer Society, 2006. 7- p.
Series
IEEE Conference on Computer Vision and Pattern Recognition. Proceedings, ISSN 1063-6919 ; 2006
Keyword [en]
Image analysis, Image processing
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:hh:diva-2171DOI: 10.1109/CVPRW.2006.36Scopus ID: 2-s2.0-33845534164Local ID: 2082/2568ISBN: 0-7695-2646-2 OAI: oai:DiVA.org:hh-2171DiVA: diva2:239389
Conference
2006 Conference on Computer Vision and Pattern Recognition Workshop, New York City, New York, 17-22 June, 2006
Note

©2006 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.

Available from: 2008-12-03 Created: 2008-12-03 Last updated: 2013-02-21Bibliographically approved

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CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf